反应条件
in neat (no solvent) byproducts: NO2, OH, CO2; H2O2 in Ar flowed over solid NOBF4; deposited onto CsI window at 15 K;
参考文献
Zhang, Xu; Nimlos, Mark R.; Ellison, G. Barney; Varner, Mychel E.; Stanton, John F.
Journal of Chemical Physics, art. no. 174308, p. 1 - 5
Journal of Chemical Physics, 2007 , vol. 126