ammonium hydroxide in tetrahydrofuran N2 or Ar; aq. NH4OH addn. dropwise to Ge-compd. soln. (THF), stirring 30min at 20°C, org. phase sepn. from. aq. phase, aq. phase extn. t wice with benzene, drying (Na2SO4), HBr addn. at 5°C, org. phase recuperationm drying (Na2SO4); solvent evapn. to dryness, recrystn. (pentane);

magnesium in tetrahydrofuran; N,N,N',N',N'',N''-hexamethylphosphoric triamide all manipulations under dry Ar; heating soln. of Me3SiCl containing Mg turnings (90°C), adding dropwise dichlorodimesitylgermane in THF, heating (40 min), cooling, filtering, adding hexane, adding 10percent HCl; washing hexane layers (H2O), concg. (vacuum); recrystn. (hexane/ethanol);

in tetrahydrofuran byproducts: LiCl; N2-atmosphere; stirring (room temp., 2 h); C6H6 addn., centrifugation, evapn. (vac.), detd. by NMR spectroscopy;

in not given investigation of exchange react. (3 d, 20°C, equimolar mixt. of educts);; detected by 1H-NMR and gas chromy.;;

in not given investigation of exchange react. (3 d, 20°C, equimolar mixt. of educts);; detected by 1H-NMR and gas chromy.;;

triethylamine in tetrahydrofuran byproducts: hydrochloric acid;

in tetrahydrofuran byproducts: LiCl;

tetrachloromethane; dibenzoyl peroxide in tetrachloromethane dry/inert atmosphere; refluxing (6 h); evapn.;

in benzene-d6 Irradiation (UV/VIS); (high vacuum system), 4h at 30°C, 254 nm; detected by NMR, GC/MS;

in diethyl ether dry/inert atmosphere; stirring (6 h); aq. HCl addn., ether layer evapn., hexane trituration, drying;