in neat (no solvent, gas phase) Kinetics; pyrolysis of acetylene (5 - 500 ppm) in mixture with Ar (temp. from 2580to 4650 K, pressure from 1.5 to 2.7 bar); not isolated;
参考文献
Journal of Physical Chemistry A, , vol. 101, # 11 p. 2138 - 2146
in gaseous matrix film formation by MPCVD from 1.5-5percent CH4/H2 on fused SiO2 substrate at 900-1000°C for 30-120 min (microwave power 140 and 700 W, bias voltage 190-210 V, bias current 8-10 mA); SEM;
in neat (no solvent) Electrochem. Process; eutectic mixture of 43.5 molpercent of Li2CO3, 31.5 molpercent of Na2CO3, and 25 molpercent of K2CO3, electrolytic reduction on Ni-electrode at 450°C; washed in HCl, dried in vac.;
参考文献
Journal of the Electrochemical Society, , vol. 149, # 5 p. D72-D78