反应条件
Kinetics; byproducts: HCl, CO2; Irradiation (UV/VIS); With Cl2 sensibilized oxidn. of CHCl3 vap., irradiation of a wavelenght = 435.8 nm, presence of O2 inhibits CCl4 formation, total pressure of 268 to 659 torr has no influence, ambient temp.;
参考文献
Chapman, A. T.
Journal of the American Chemical Society, 1935 , vol. 57, p. 416 - 419
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Schumacher, H.-J.; Wolff, K.
Zeitschrift fuer Physikalische Chemie, Abteilung B: Chemie der Elementarprozesse, Aufbau der Materie, 1934 , vol. 26, p. 453 - 462
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Gmelin Handbook: C: MVol.D3, 2.2.2.4, page 59 - 61