Mg in tetrahydrofuran under high-vac. techniques; mixt. of bromobenzene, C6H5CH2SnMe3 and Mg in THF stirred for 26 h at room temp.; quenched with Me3GeCl; Et2O added; org. and aq. fractions sepd.; org. fraction dried (MgSO4); analyzed by NMR; sepd. by chromy.;

bromobenzene; magnesium in tetrahydrofuran reaction of stannane with PhBr/Mg, then with excess Me3GeCl;

CH3MgI in diethyl ether; benzene Norbornadiene-compound and PhCH2I are heated at 75°C in benzene under Ar, benzylic products (10-20 percent) are methylated in Et2O (MeMgI, stirring at 0°C for 0.5 h, then stirring at room temp. for 1 h).; addn. of H2O and NH4Cl, sepn. of organic and aq. phases, extn. of aq. phase (Et2O), removal of solvent, investigation by GC-MS anal., further products are Me8Ge3, Me10Ge4, Me12Ge5 in ca. 70 percent yield;

CH3MgBr in diethyl ether Methylation of reaction mixture with MeMgBr in Et2O at 0°C with stirring for 0.5 h, then stirring of the mixture at room temp. for 1 h under Ar.; addn. of H2O and NH4Cl, sepn. of phases, extn. of aq. phase (Et2O), removal of solvent, pptn. of tetraphenylnaphthalene (pentane), investigation of crude products by GC-MS anal.;

in diethyl ether; benzene competitive react. of Ge compd. as compared with Me3SiCl; a soln. of Mg compd. in Et2O added dropwise to a mixt. of Ge compd. and Si compd. in C6H6, stirred for 0.5 h at room temp.; decompd. (H2O), the aq. layer treated with Et2O, the combined org. layers evapd. (vac.), the residue analyzed by GLC;

in cyclohexane Irradiation (UV/VIS); Further products.;

in diethyl ether; benzene competitive react.; a soln. of Mg compd. in Et2O added dropwise to a mixt. of Ge compds. in C6H6, stirred for 0.5 h at room temp.; decompd. (H2O), the aq. layer treated with Et2O, the combined org. layers evapd. (vac.), the residue analyzed by GLC; not isolated;