反应条件
in neat (no solvent) equimolar amts. of Me3SnH and SiF2Cl2 room temp., 3.5 days; removing of Me3SnBr by trap coolingto -131°C, cooling to -196°C; not isolated; IR, (1)H-, (19)F-NMR spectroscopy (identified 5percent SiF3H, 5percent SiH4 and 5percent SiFCl2H in product mixt.);
参考文献
D'Errico, John J.; Sharp, Kenneth G.
Inorganic Chemistry, 1989 , vol. 28, p. 2177 - 2180
