反应条件
in neat (no solvent) byproducts: H2O; Irradiation (UV/VIS); laser ablated Zr co-deposited with H2O2 in excess Ar onto a 10K CsI window, UV irradiated, annealed at 22-30 K; not isolated, detected by IR;
参考文献
Journal of Physical Chemistry A, , vol. 109, # 47 p. 10689 - 10701