硅(IV)酞菁二(三己基甲硅烷基氧化物)合成路线 （共 4 条）
反应条件
sodium hydroxide; Aliquat.(R). HTA-1 in chlorobenzene
T=132°C; 6 h; Product distribution / selectivity;
参考文献
BASF SE
Patent: US2010/113767 A1, 2010 ;
Location in patent: Page/Page column 11 ;
反应条件
sodium hydroxide; Aliquat.(R). HTA-1 in water; chlorobenzene
T=20°C; Reflux;
参考文献
BASF SE
Patent: US2010/113767 A1, 2010 ;
Location in patent: Page/Page column 12 ;
反应条件
1: tri-n-hexylsilyl chloride; triphenyl-silyl chloride With sodium hydroxide; Aliquat.(R). HTA-1 in chlorobenzene
T=20°C; 1 h;
2: (Cl)2Si(phthalocyanine) in chlorobenzene
T=132°C; 6 h;
参考文献
BASF SE
Patent: US2010/113767 A1, 2010 ;
Location in patent: Page/Page column 13 ;
反应条件
pyridine
T=115°C; 5 h;
参考文献
BASF SE
Patent: US2010/113767 A1, 2010 ;
Location in patent: Page/Page column 10-11 ;
