反应条件
in further solvent(s) solvent: anhydrous HF; AgF3 in solvent exposed to large excess of Xe gas at 20 ° C, mixture allowed to ionteract at ca. 20 ° C for 1 h,; tube cooled to -78 ° C,excess Xe and solvent removed under vac.,mixture warmed to ca. 20 ° C,XeF2 on the walls of the tube and AgF2 in the bottom (X-ray powder photograph identical with that of authentic sample);
参考文献
Zemva, Boris; Lutar, Karel; Jesih, Adolf; Casteel Jr., William J.; Wilkinson, Angus P.; Cox, David E.; Von Dreele, Robert B.; Borrmann, Horst; Bartlett, Neil
Journal of the American Chemical Society, 1991 , vol. 113, # 11 p. 4192 - 4198