in benzene Schlenk techniques used; protective gas: N2; detailed description given; to stirred soln. of W(CO)3PMTA in benzene, BF3*OEt2 was added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); 1. fraction (W(CO)6C6H6: evapn.; recrystn. (CH2Cl2/pentane/-20°C); 2. fraction (W(CO)4PMTA): evapn.; recrystn. (CH2Cl2/hexane/-20°C); elem. anal.;;

in tetrahydrofuran Schlenk techniques used; protective gas: N2; detailed description given; to stirred suspension of W(CO)3PMTA in THF, p-xylene and BF3*OEt2 were added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;

in tetrahydrofuran Schlenk techniques used; protective gas: N2; detailed description given; to stirred suspension of W(CO)3PMTA in THF, Me6C6 and BF3*OEt2 were added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;

in chlorobenzene Schlenk techniques used; protective gas: N2; detailed description given; heating (70°C/3 h) of W(CO)3PMTA and BF3*OEt2 in chlorobenzene; cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C); elem. anal.;;

in toluene Schlenk techniques used; protective gas: N2; detailed description given; to stirred soln. of W(CO)3PMTA in toluene, BF3*OEt2 was added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;