Streng, A.
Journal of the American Chemical Society, 1963 , vol. 85, p. 1380 - 1385
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Gmelin Handbook: Cl: SVol.B2, 124, page 578 - 579
in neat (no solvent) distillation of O2F2 into boron silicate glass in vacuum; cooling at 90°K; addn. of equimolar amount ClF at 119 - 140°K; cooling at 90°K; evacuation of F2 and Cl2;;
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Streng, A. G.; Grosse, A. V.
Advances in Chemistry Series, 1962 , vol. 36, p. 159 - 165
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Gmelin Handbook: Cl: SVol.B2, 124, page 578 - 579
byproducts: CO, O2; FOOF mol. beam reacting with SiC target in UHV system, according to M. Balooch, D. R., Olander, Surf. Sci. 261 (1992) 321; mass spectrometric monitoring;
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Applied Physics Letters, , vol. 66, p. 3480 - 3482
on react. of O2F2 at -118°C with Xe, formation of a light yellow solid compd., from which XeF2 is sublimated off at 50°C;;
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Morrow, S. I.; Young, A. R.
Inorganic Chemistry, 1965 , vol. 4, p. 759 - 759
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Gmelin Handbook: He: Edelgasverb., 1.8.1.2.1, page 26 - 29
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Thiokol Chemical Corp.
Patent: US3377136 , 1968 ;
C. A., 1968 , vol. 68, p. 106519
