in neat (no solvent) byproducts: silicium fluorides; passing F2 over sulfur in copper tube (atm. of dry nitrogen);; storage over concd. aq. KOH for some time (removal of SF2 and silicium fluorides); fractionate distillation (removal of main product SF6);;
in neat (no solvent) byproducts: CF4; introduction of F2 (from electrolysis/graphite anode); abs. exclusion of air (N2 atm.); detailed description of apparatus and handling given;; condensed (liquid air); storage over aq. KOH (for weeks); repeated fractionating (and drying); passing over liquid mixture of metallic Na/K (removal of SO2F2;;
