双(三甲基硅氧基)甲基甲氧基硅烷合成路线 (共 2 条)
反应条件
sulfuric acid T=20 - 25°C; 3 h; Product distribution / selectivity;
参考文献
Shin-Etsu Chemical Co., Ltd.
Patent: EP1510520 A1, 2005 ;
Location in patent: Page/Page column 10 ;
反应条件
1: bis-trimethylsilyl ether With methanol; sulfuric acid
T=5 - 10°C; 1 h;
2: monomethyl trimethoxy silane T=5 - 10°C; 1.5 - 1.75 h;
3: With sulfuric acid; water
Product distribution / selectivity; more than 3 stages;
参考文献
Shin-Etsu Chemical Co., Ltd.
Patent: EP1510520 A1, 2005 ;
Location in patent: Page/Page column 10-11 ;