反应条件
in neat (no solvent) low pressure chemical vapour deposition onto stainless steel, Fe, Mo, Ta, W, Si and SiO2 substrates; reactor evacuated to base pressure ca. 10**-4 Pa, deposition time ca. 40 min, flow mode at 490 °C, pressure 90-100 Pa; detd. by electron microscopy;
参考文献
Journal of the Electrochemical Society, , vol. 157, # 10 p. K218-K222