hydrogen in toluene CoCl2 loaded into toluene-soln. of polystyrene-block-poly(4-vinyl pyridine), treated with O2 plasma for 10 min, hydrogen annealing at 400 °C for 1 h to reduce CoO;
hydrazine hydrate in ethanol; water byproducts: N2, water; High Pressure; dissolving of CoCl2*6H2O in H2O; dropping NaOH soln. under intense stirring; dropping of N2H4*H2O soln. and EtOH; transferring into Teflon-linedstainless-steel autoclave; heating at 160°C for 10 h; washing with H2O and acetone; drying in vac. oven at 60°C for 12 h;
参考文献
Journal of Magnetism and Magnetic Materials, , vol. 321, # 17 p. 2566 - 2570
NH3 or H2 in neat (no solvent) ALD Co films developed using bis(N,N'-diisopropylacetamidinato) Co(II) in stainless steel bubler at 65°C with NH3 or H2 reactant gas on Si or SiO2 substrates at 350°C;
参考文献
Journal of the Electrochemical Society, , vol. 157, # 1 p. D10-D15
