in neat (no solvent) High Pressure; detonation of TNT + hexogen charges in 2-m**3 chamber; X-ray diffraction anal.; isoln. of diamond by oxidn. of nondiamond carbon with air at 720 K in the presence of B2O3 followed by boiling in dilute HCl; washing with water to constant pH; drying ppt. at 380 K;
in neat (no solvent, gas phase) Electric Arc; DC Plasma Glow Discharge reactor; 3.8-1.2 vol percent CH4 in H2, 1000-1090°C, pressure of 200-250 torr; detd. by scanning electron microscopy, X-ray diffraction and Micro-Ramanspectroscopy;