in neat (no solvent) byproducts: HCl, H2; Irradiation (UV/VIS); irradiating SiH2Cl2-C2H4 gas mixt. with CO2 laser at atmospheric pressure (reaction flame temp. from less than 1273 K to more than 3073 K depending on power density and C2H4/SiH2Cl2 ratio); X-ray powder diffraction, transmission electron microscopy;
参考文献
Journal of Materials Science, , vol. 27, p. 6091 - 6097
in neat (no solvent) reaction in a high pressure tube at 150 atm and 300°C, formation of C6Cl6 as main product and C2Cl6, at 500°C, formation of C;; impurities of FeCl3, NiCl2 and CrCl3 by reaction of Cl2 with the material of the tube;;
参考文献
J. Sci. Ind. Res. (India) B, , vol. 19, p. 244 - 246
