反应条件
in solid matrix byproducts: HF, H2O, O2F; Irradiation (UV/VIS); dilg. SiH4 with Ar (various ratios); codeposition with F2 dild. with Ar (various ratios) on a substrate at 13.+-1. K; UV-photolysis (220-1000 nm) for 1 h; annealing to 25.+-.2 K;; not isolated, identified by IR-spectroscopy; further products;;
参考文献
Journal of Physical Chemistry, , vol. 96, # 13 p. 5276 - 5284