byproducts: H2, H; dissociative excitation of SiH4 by collisions with He, He(1+) and He2(1+) (generated in microwave discharge at 0.4-1.0 Torr) in flowing afterglow and beam apparatus (0.5-1.0 Torr He, 0.05-0.1 Torr SiH4);
参考文献
Chemical Physics Letters, , vol. 158, p. 470 - 474
in melt MoO3, SiO2, Mg and NaCl mixed for 12 h, pressed, combusted at 1300, 1520, 1800°C with ignition agent Ti+C; treated with HCl and NaOH; monitored by XRD;
参考文献
Journal of the American Ceramic Society, , vol. 91, # 9 p. 2802 - 2807
