Na byproducts: NaCl; steel autoclave, under Ar, 600 °C for 5-12 h; cooling to room temp., washing with abs. EtOH, H2SO4 and HF then H2O, drying in vac. at 70 °C for 3 h;
参考文献
Chemical Physics Letters, , vol. 375, # 1-2 p. 177 - 184
in solid deposition from a preset SiH4-N2O mixt. in N2 as carrier gas onto the (111) face of previously cleaned in HF single-crystal silicon (at 625°C); then heating at 900°C for 30 min;;
参考文献
Journal of the Chemical Society, Chemical Communications, , # 4 p. 359 - 361
