water T=20°C; IrradiationH/D separation factors, other temperatures; Thermodynamic data;
参考文献
Dave, S. M.; Ghosh, S. K.; Sadhukhan, H. K.
Indian Journal of Chemistry, Section A: Inorganic, Physical, Theoretical & Analytical, 1981 , vol. 20, # 11 p. 1107 - 1109
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
