1-氯-1,1,3,3,3-五氟丙烷合成路线 （共 20 条）
反应条件
potassium hydroxide in water T=110 - 120°C; 5 h;
参考文献
HONEYWELL INTERNATIONAL,INC.
Patent: US2005/70746 A1, 2005 ;
Location in patent: Page/Page column 4 ;
参考文献
Henne; Waalkes
Journal of the American Chemical Society, 1946 , vol. 68, p. 496
反应条件
hydrogen fluoride; 20 CrCl3 on carbon T=53 - 400°C; 4.5 h; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 14-15 ;
反应条件
hydrogen fluoride; 20 CrCl3 on carbon T=53 - 400°C; 4.5 h; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 14-15 ;
反应条件
hydrogen fluoride; 20 CrCl3 on carbon T=53 - 400°C; 4.5 h; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 14-15 ;
反应条件
1: With sulfuric acid; sulfur trioxide T=100 - 125°C; 19 - 30 h; 2: With water T=20°C; Product distribution / selectivity;
参考文献
Solvay S.A.
Patent: EP1754697 A1, 2007 ;
Location in patent: Page/Page column 4-5 ;
反应条件
hydrogen fluoride; chlorine; antimony(V) pentachloride
T=80 - 95°C; P=8517.48 - 10069 Torr;
参考文献
HONEYWELL INTERNATIONAL,INC.
Patent: US2005/70746 A1, 2005 ;
Location in patent: Page/Page column 4 ;
反应条件
chlorine
1 h; Gas phasePhotolysis; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69108 A1, 2006 ;
Location in patent: Page/Page column 12; 13 ;
反应条件
chlorine
T=2 - 3°C; 3 h; Irradiation;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 12 ;
反应条件
chlorine
T=20°C; 0.00166667 h; Irradiation;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 14 ;
