4-[4-[4-(三氟甲基)苯基]-2-噻唑]-磺酰氯合成路线 （共 8 条）
反应条件
1.1: conc. HBr; bromine / acetic acid / 1.5 h / 15 °C 2.1: 95 percent / ethanol / 4 h / 45 °C 3.1: 95 percent / lithium diisopropylamide / CH2Cl2 / 0.75 h / -50 °C 4.1: n-butyllithium / tetrahydrofuran / 0.5 h / -74 °C 4.2: SO2 / tetrahydrofuran / -50 - 20 °C 5.1: HF / acetonitrile; H2O / 4 h 6.1: sulfuryl chloride / acetonitrile / 0.5 h / 2 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: 95 percent / ethanol / 4 h / 45 °C 2.1: 95 percent / lithium diisopropylamide / CH2Cl2 / 0.75 h / -50 °C 3.1: n-butyllithium / tetrahydrofuran / 0.5 h / -74 °C 3.2: SO2 / tetrahydrofuran / -50 - 20 °C 4.1: HF / acetonitrile; H2O / 4 h 5.1: sulfuryl chloride / acetonitrile / 0.5 h / 2 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: 89 percent / propan-2-ol / 4 h / 48 °C 2.1: hydrochloric acid; NaNO2 / acetonitrile; H2O / 0.42 h / 10 °C 2.2: SO2; acetic acid; CuCl2*2H2O / acetonitrile; H2O / 2.5 h View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: 92 percent / pyridine; triethylamine; hydrogen sulfide / 22 h / 60 °C 2.1: 89 percent / propan-2-ol / 4 h / 48 °C 3.1: hydrochloric acid; NaNO2 / acetonitrile; H2O / 0.42 h / 10 °C 3.2: SO2; acetic acid; CuCl2*2H2O / acetonitrile; H2O / 2.5 h View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: 95 percent / ethanol / 4 h / 45 °C 2.1: 95 percent / lithium diisopropylamide / CH2Cl2 / 0.75 h / -50 °C 3.1: n-butyllithium / tetrahydrofuran / 0.5 h / -74 °C 3.2: SO2 / tetrahydrofuran / -50 - 20 °C 4.1: HF / acetonitrile; H2O / 4 h 5.1: sulfuryl chloride / acetonitrile / 0.5 h / 2 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1: 78 percent / oleum / 4 h / -5 °C 2: 97 percent / thionyl chloride; DMF / acetonitrile / 3.5 h / 20 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: 95 percent / lithium diisopropylamide / CH2Cl2 / 0.75 h / -50 °C 2.1: n-butyllithium / tetrahydrofuran / 0.5 h / -74 °C 2.2: SO2 / tetrahydrofuran / -50 - 20 °C 3.1: HF / acetonitrile; H2O / 4 h 4.1: sulfuryl chloride / acetonitrile / 0.5 h / 2 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
反应条件
1.1: n-butyllithium / tetrahydrofuran / 0.5 h / -74 °C 1.2: SO2 / tetrahydrofuran / -50 - 20 °C 2.1: HF / acetonitrile; H2O / 4 h 3.1: sulfuryl chloride / acetonitrile / 0.5 h / 2 °C View Scheme
参考文献
Ikemoto, Norihiro; Liu, Jinchu; Brands, Karel M.J.; McNamara, James M.; Reider, Paul J.
Tetrahedron, 2003 , vol. 59, # 8 p. 1317 - 1325
