反应条件
in neat (no solvent) byproducts: SiO2, H2O; slow decomposition of dioxodisiloxane at room temp., accelerated at higher temp.;; formation of amorphous Si;;
参考文献
Stock, A.; Somieski, C.; Wintgen, R.
Ber., 1917 , vol. 50, p. 1754 - 1764
Full Text Show Details
Gmelin Handbook: Si: MVol.B, 1, page 1 - 3