1,1,2-三氯-3,3,3-三氟丙稀合成路线 (共 179 条)
反应条件
hydrogen fluoride; chlorine; cobalt(II) chromite in nitrogen
T=375°C; P=760.051 Torr; 0.00416667 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2004/18397 A1, 2004 ;
Location in patent: Page 23; 25 ;
反应条件
hydrogen fluoride; chlorine
T=280°C; P=760.051 Torr; 0.00833333 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2005/37743 A1, 2005 ;
Location in patent: Page/Page column 15-16; 17 ;
反应条件
hydrogen fluoride; chlorine; Cr(NO3)3/Zn(NO3)2 98/2 calcined at 450 C
T=320°C; P=760.051 Torr; 0.00833333 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2005/37742 A1, 2005 ;
Location in patent: Page/Page column 15-16; 17 ;
反应条件
hydrogen fluoride; chlorine; zinc alumina-supported catalyst
T=280°C; P=760.051 Torr; 0.00833333 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2005/37743 A1, 2005 ;
Location in patent: Page/Page column 15-16; 17 ;
反应条件
hydrogen fluoride; chlorine; Cr(NO3)3/Zn(NO3)2 95/5 calcined at 450 C
T=280°C; P=760.051 Torr; 0.00833333 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2005/37743 A1, 2005 ;
Location in patent: Page/Page column 15-16; 17 ;
反应条件
hydrogen fluoride; Cr(NO3)3[9(H2O)]; HAuCl4; AgNO3; calcined
T=250 - 400°C; 0.00138889 h; Product distribution / selectivity;
参考文献
Rao, Velliyur Nott Mallikarjuna; Sievert, Allen Capron
Patent: US2008/207962 A1, 2008 ;
Location in patent: Page/Page column 12-13 ;
反应条件
hydrogen fluoride; chlorine; Cr(NO3)3; AuCl3; NH4OH; calcined; Cr/Au=98/2
T=280 - 400°C; Product distribution / selectivity;
参考文献
Rao, Velliyur Nott Mallikarjuna; Sievert, Allen Capron; Rosenfeld, H. David; Subramoney, Shekhar
Patent: US2008/207964 A1, 2008 ;
Location in patent: Page/Page column 14-15 ;
反应条件
hydrogen fluoride; chlorine; Cr(NO3)3[9(H2O)]; HAuCl4; AgNO3; calcined
T=280 - 400°C; 0.00138889 h; Product distribution / selectivity;
参考文献
Rao, Velliyur Nott Mallikarjuna; Sievert, Allen Capron
Patent: US2008/207962 A1, 2008 ;
Location in patent: Page/Page column 12-13 ;
反应条件
hydrogen fluoride; chlorine; Cr(NO3)3[9(H2O)]; AgNO3; calcined
T=280 - 450°C; 0.00138889 - 0.00416667 h; Product distribution / selectivity;
参考文献
Rao, Velliyur Nott Mallikarjuna; Sievert, Allen Capron
Patent: US2008/207963 A1, 2008 ;
Location in patent: Page/Page column 8-9 ;
反应条件
hydrogen fluoride; copper-substituted α-chromium oxide (99percent chromium/1percent copper) treated with HF
T=280°C; P=760.051 Torr; 0.00138889 h; Inert atmosphereMonel.(TM). nickel alloy tube packed with Monel.(TM). turnings;
参考文献
Rao, Velliyur Nott Mallikarjuna; Rosenfeld, H. David; Sievert, Allen; Subramoney, Shekhar
Patent: US2010/152503 A1, 2010 ;
Location in patent: Page/Page column 11 ;