oxygen 25°C, 12 h, further product;

oxygen in neat (no solvent) Irradiation (UV/VIS); photochemical oxidation;;

byproducts: SO2F2, SOF4, SF6; Irradiation (UV/VIS); irradn. for 4 h at 22°C; collection in a -196°C trap (dynamic vacuum); fractional condensation; SF5OSF5 and SF5O2SF5 in -111°C trap; mixt. heated in copper reactor at 237°C for 2.5 h;; fractional condensation yielded SF5OSF5 in a -118°C trap; further compounds (from decompn. of SF5O2SF5) in -196°C trap;;

byproducts: SiF4; in a Ni-autoclave, 225°C, 5 h, further products; distn.;

Irradiation (UV/VIS);