2,3,6-三氟-5-硝基吡啶-4-胺合成路线 （共 6 条）
反应条件
sulfuric acid
T=20°C; 18 h;
参考文献
Sartorelli, Alan C.; Cheng, Yung-Chi; Liu, Mao-Chin
Patent: US2004/116362 A1, 2004 ;
Location in patent: Page/Page column 13; Figure 2 ;
反应条件
1: 96 percent / Et3N; H2 / 10 percent Pd/C / ethanol / 18 h / 2585.74 Torr
2: 88 percent / conc. H2SO4; KNO3 / 0 - 20 °C
3: 40 percent / conc. H2SO4 / 18 h / 20 °C
View Scheme
参考文献
Liu; Luo; Mozdziesz; Lin; Dutschman; Gullen; Cheng; Sartorelli
Nucleosides, Nucleotides and Nucleic Acids, 2001 , vol. 20, # 12 p. 1975 - 2000
反应条件
1: 99 percent / aq. NH4OH / 5 h / 20 °C
2: 96 percent / Et3N; H2 / 10 percent Pd/C / ethanol / 18 h / 2585.74 Torr
3: 88 percent / conc. H2SO4; KNO3 / 0 - 20 °C
4: 40 percent / conc. H2SO4 / 18 h / 20 °C
View Scheme
参考文献
Liu; Luo; Mozdziesz; Lin; Dutschman; Gullen; Cheng; Sartorelli
Nucleosides, Nucleotides and Nucleic Acids, 2001 , vol. 20, # 12 p. 1975 - 2000
反应条件
1: 88 percent / conc. H2SO4; KNO3 / 0 - 20 °C
2: 40 percent / conc. H2SO4 / 18 h / 20 °C
View Scheme
参考文献
Liu; Luo; Mozdziesz; Lin; Dutschman; Gullen; Cheng; Sartorelli
Nucleosides, Nucleotides and Nucleic Acids, 2001 , vol. 20, # 12 p. 1975 - 2000
反应条件
hydrogen; nickel in ethanol
P=1861.73 Torr; 2 h;
参考文献
Sartorelli, Alan C.; Cheng, Yung-Chi; Liu, Mao-Chin
Patent: US2004/116362 A1, 2004 ;
Location in patent: Page/Page column 13; Figure 2 ;
反应条件
1: 98 percent / H2 / Raney Ni / ethanol / 2 h / 1861.73 Torr
2: 47 percent / 1 h / 100 °C
View Scheme
参考文献
Liu; Luo; Mozdziesz; Lin; Dutschman; Gullen; Cheng; Sartorelli
Nucleosides, Nucleotides and Nucleic Acids, 2001 , vol. 20, # 12 p. 1975 - 2000
