3-溴-5-(三氟甲基)苯甲酸合成路线 （共 11 条）
反应条件
N-bromosuccinmide; sulfuric acid in trifluoroacetic acid T=18 - 22°C; 0.5 h;
参考文献
Boehringer Ingelheim International GmbH
Patent: US2006/69261 A1, 2006 ;
Location in patent: Page/Page column 18 ;
反应条件
1: With hydrogen bromide; sodium nitrite in water T=0°C; 1 h; 2: With copper(ll) bromide in water T=20°C; 16 h;
参考文献
Pfizer Inc
Patent: US2007/213371 A1, 2007 ;
Location in patent: Page/Page column 70 ;
反应条件
1: 1-bromo-3-iodo-5-(trifluoromethyl)benzene With n-butyllithium in tetrahydrofuran; hexane 2: carbon dioxide Further stages.;
参考文献
Marzi, Elena; Spitaleri, Andrea; Mongin, Florence; Schlosser, Manfred
European Journal of Organic Chemistry, 2002 , # 15 p. 2508 - 2517
反应条件
1.1: tetramethylpiperidine; butyllithium / tetrahydrofuran; hexane / 2 h / -100 °C 1.2: 82 percent / iodine / tetrahydrofuran; hexane 2.1: butyllithium / tetrahydrofuran; hexane / 2 h / -100 °C 3.1: 81 percent / butylllithium / tetrahydrofuran; hexane View Scheme
参考文献
European Journal of Organic Chemistry, , # 15 p. 2508 - 2517
反应条件
1: butyllithium / tetrahydrofuran; hexane / 2 h / -100 °C 2: 81 percent / butylllithium / tetrahydrofuran; hexane View Scheme
参考文献
European Journal of Organic Chemistry, , # 15 p. 2508 - 2517
反应条件
1: oxalyl dichloride; N,N-dimethyl-formamide / dichloromethane / 0.5 h / 0 °C 2: triethylamine / dichloromethane / 1 h / 0 °C 3: diisobutylaluminium hydride / tetrahydrofuran; toluene / 0.33 h / -40 - 20 °C View Scheme
反应条件
1: triethylamine; HATU / dichloromethane / 20 °C 2: tetrahydrofuran / 2 h / 0 °C / Inert atmosphere View Scheme
参考文献
PHENEX PHARMACEUTICALS AG; STEENECK, Christoph; KINZEL, Olaf; GEGE, Christian; KLEYMANN, Gerald; HOFFMANN, Thomas
Patent: WO2012/139775 A1, 2012 ;
WO 2012/139775 A1
反应条件
1: With borane-THF in tetrahydrofuran T=65°C; 2 h; 2: With water; sodium hydrogencarbonate in tetrahydrofuran
参考文献
WO2008/9435 A1, ;
Page/Page column 162 ;
反应条件
tetrakis(triphenylphosphine) palladium(0) in water; N,N-dimethyl-formamide
T=120°C; 3 h; Inert atmosphere;
参考文献
BAYER INTELLECTUAL PROPERTY GMBH; SÜßMEIER, Frank; LOBELL, Mario; GRÜNEWALD, Sylvia; HÄRTER, Michael; BUCHMANN, Bernd; TELSER, Joachim; JÖRIßEN, Hannah; HEROULT, Melanie; KAHNERT, Antje; LUSTIG, Klemens; LINDNER, Niels
Patent: US2013/190290 A1, 2013 ;
Location in patent: Paragraph 0850; 0851; 0852; 0853 ;
反应条件
in N,N-dimethyl-formamide
T=150°C;
参考文献
KARYOPHARM THERAPEUTICS, INC.; SANDANAYAKA, Vincent, P.; SHACHAM, Sharon; SHECHTER, Sharon; MCCAULEY, Dilara
Patent: WO2012/99807 A1, 2012 ;
Location in patent: Page/Page column 113 ;
WO 2012/099807 A1
