in benzene
1.75 h; Irradiationvar. solvents and time; benzophenone-sensitized photolysis; also in presence norbornene and dimethyl acetylenedicarboxylate; Product distribution;
参考文献
Adam, Waldemar; Berkessel, Albrecht; Hildenbrand, Knut; Peters, Eva-Maria; Peters, Karl; Schnering, Hans Georg von
Journal of Organic Chemistry, 1985 , vol. 50, # 24 p. 4899 - 4909