1,1,1,2,3-五氯丙烷合成路线 （共 52 条）
反应条件
Chlorieren, zunaechst im Sonnenlicht in der Dampfphase, dann in fluessiger Phase unter Kuehlung; Produkt 5: 1.1.1.3-Tetrachlor-propan;
参考文献
Henne; Whaley
Journal of the American Chemical Society, 1942 , vol. 64, p. 1157
参考文献
Shelton; Lee
Journal of Organic Chemistry, 1959 , vol. 24, p. 1271,1273
反应条件
T=185°C; mit UV-Licht.Irradiation;
参考文献
Ponomarenko; Snegowa
Zhurnal Obshchei Khimii, 1957 , vol. 27, p. 2067,2070; engl. Ausg. S. 2122, 2125
参考文献
Freidlina et al.
Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, 1956 , p. 1202,1204;engl.Ausg.S.1229,1231
参考文献
Freidlina et al.
Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, 1956 , p. 1202,1204;engl.Ausg.S.1229,1231
反应条件
hydrogen fluoride
T=340°C; P=760.051 Torr; 86 h; Gas phase; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; NOSE, Masatoshi; KOMATSU, Yuzo
Patent: WO2013/15068 A1, 2013 ;
Location in patent: Page/Page column 13-15; 18 ;
反应条件
hydrogen fluoride
T=380°C; P=760.051 Torr; 86 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA FRANCE; DEUR-BERT, Dominique; PIGAMO, Anne; DOUCET, Nicolas; WENDLINGER, Laurent
Patent: WO2012/98420 A1, 2012 ;
Location in patent: Page/Page column 14 ;
反应条件
T=300°C; P=2250.23 Torr; 550 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA FRANCE; DEUR-BERT, Dominique; PIGAMO, Anne; DOUCET, Nicolas; WENDLINGER, Laurent
Patent: WO2012/98420 A1, 2012 ;
Location in patent: Page/Page column 14-15 ;
反应条件
antimony(V) pentachloride; SbF3
参考文献
Nose, Masatoshi; Yamashita, Tsuneo; Suzuki, Atsushi
Patent: US2012/65434 A1, 2012 ;
Location in patent: Page/Page column 6 ;
反应条件
hydrogen fluoride
T=290°C; P=750.075 Torr; 3 h; Inert atmospheretubular reactor;
参考文献
Nose, Masatoshi; Yamashita, Tsuneo; Suzuki, Atsushi
Patent: US2012/65434 A1, 2012 ;
Location in patent: Page/Page column 5 ;
