in neat (no solvent) byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 percent;;

in neat (no solvent) sealed pyrex tube, room temp. (7 d); fractional distillation;

in diethyl ether below 213 K;

in neat (no solvent) byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 percent;;

in neat (no solvent) byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 percent;;

in neat (no solvent) sealed pyrex tube, room temp. (7 d); fractional distillation;