in solid matrix Irradiation (UV/VIS); reaction of hafnium laser ablated atoms with nitrogen trifluoride in Ar with condensation at 8 K for 60 min, annealing to 20 K, irradiation at >220 nm for 15 min; IR monitoring;
in neat (no solvent) heating of starting materials in a Pt-crucible at 200-400°C; treatment with gaseous HF at 650°C to remove traces of oxide and oxidefluoride;
参考文献
Journal of Alloys and Compounds, , vol. 205, p. 17 - 20
in solid matrix Irradiation (UV/VIS); reaction of hafnium laser ablated atoms with arsenic trifluoride in Ar with condensation at 5 K for 60 min, irradiation at 290 mn for 15 min, irradiation at >220 nm for 15 min; IR monitoring;
