反应条件
phenol-formaldehyde resin in neat (no solvent)
55 wt percent SiO2, 25 wt. percent C, 20 wt. percent phenol-formaldehyde resin, 1600°C, 30 min, closed vessel, N2-atmosphere (9.93E-6 MPa N2); product mixt. not sepd., detd. by powder X-ray diffraction;
参考文献
Kalacheva, M. V.; Lyubimov, V. D.; Tskhai, V. A.; Shveikin, G. P.
Russian Journal of Inorganic Chemistry (Translation of Zhurnal Neorganicheskoi Khimii), 1993 , vol. 38, p. 1838 - 1843
Zhurnal Neorganicheskoi Khimii, 1993 , vol. 38, p. 1963 - 1969
