1173018-52-4合成路线 （共 10 条）
反应条件
in neat (no solvent) (Ar); reacting nickel complex with (16)O2 at 278 K for 8 h;
参考文献
Aresta, Michele; Tommasi, Immacolata; Dibenedetto, Angela; Fouassier, Monique; Mascetti, Joelle
Inorganica Chimica Acta, 2002 , vol. 330, # 1 p. 63 - 71
反应条件
ethanol; Titanium(IV) oxide in gaseous matrix Irradiation (UV/VIS); photocatalytic reactor (six 4 W UV lapms), He carrier gas;
参考文献
Journal of Catalysis, , vol. 181, # 1 p. 155 - 159
反应条件
Kinetics; in He buffer, pressure: 0.4 Torr;
参考文献
Journal of Chemical Physics, , vol. 76, # 4 p. 1799 - 1805
反应条件
in neat (no solvent) oxygen adsorption (200-373 K) on the surface of partially reduced CeO2; detn. by FT-IR;
参考文献
Li, Can; Domen, Kazunari; Maruya, Ken-ichi; Onishi, Takaharu
Journal of the American Chemical Society, 1989 , vol. 111, # 20 p. 7683 - 7687
反应条件
in gaseous matrix
Tesla coil discharge in (16)O2/(18)O2/Ar mixt.; O3 trapping at liq. N2 temp.;
参考文献
Valentini, James J.; Gerrity, Daniel P.; Phillips, David L.; Nieh, Jong-Chen; Tabor, Kevin D.
Journal of Chemical Physics, 1987 , vol. 86, # 12 p. 6745 - 6756
反应条件
electron in gaseous matrix
Irradiation (UV/VIS); 1064 nm Nd:YAG laser focusing on Ni or Cu target, metal atoms and electrons with 0.2percent O2/Ne codeposition for 2-6 h onto 4 K substrate, accordingto T. R. Burkholder, L. Andrews, J. Chem. Phys. 95 (1991) 8697;
参考文献
Zhou, Mingfei; Hacaloglu, Jale; Andrews, Lester
Journal of Chemical Physics, 1999 , vol. 110, # 19 p. 9450 - 9456
反应条件
electron in gaseous matrix
Irradiation (UV/VIS); 1064 nm Nd:YAG laser focusing on Ni or Cu target, metal atoms and electrons with 0.2percent O2/Ne codeposition for 2-6 h onto 4 K substrate, accordingto T. R. Burkholder, L. Andrews, J. Chem. Phys. 95 (1991) 8697;
参考文献
Zhou, Mingfei; Hacaloglu, Jale; Andrews, Lester
Journal of Chemical Physics, 1999 , vol. 110, # 19 p. 9450 - 9456
反应条件
in gaseous matrix
Irradiation (UV/VIS); rotating metal target irradiation with Nd:YAG laser (1064 nm, 10 Hz, 10 ns, 40-50 mJ/pulse), metal atoms codeposition with 0.5percent (16)O2/0.5percent (18)O2/Ar at 2-4 mmol/h for 1-3 h at 10 K, eventual annealing up to 35 K;
参考文献
Chertihin, George V.; Bare, William D.; Andrews, Lester
Journal of Chemical Physics, 1997 , vol. 107, # 8 p. 2798 - 2806
反应条件
in gaseous matrix
Irradiation (UV/VIS); rotating metal target irradiation with Nd:YAG laser (1064 nm, 10 Hz, 10 ns, 40-50 mJ/pulse), metal atoms codeposition with 0.5percent (16)O2/0.5percent (18)O2/0.5percent (16)O(18)O/Ar at 2-4 mmol/h for 1-3 h at 10 K, eventual annealing up to 35 K;
参考文献
Chertihin, George V.; Bare, William D.; Andrews, Lester
Journal of Chemical Physics, 1997 , vol. 107, # 8 p. 2798 - 2806
反应条件
catalyst: manganese-bismuth oxide/α-Al2O3 in neat (no solvent)
fresh catalyst placed in a flowthrough quartz reactor; catalyst heated at various temperatures; NH3 and O2 passed through the catalyst; not isolated; detected by mass spectrometry;
参考文献
Slavinskaya; Veniaminov; Notte; Ivanova; Boronin; Chesalov; Polukhina; Noskov
Journal of Catalysis, 2004 , vol. 222, # 1 p. 129 - 142
