1: in o-xylene T=120°C; 48 - 54 h; 2: With sulfuric acid in o-xylene; water pH=1.8; 3: With sodium hydroxide in o-xylene; water pH=8; Product distribution / selectivity;
参考文献
DSM IP Assets B.V.
Patent: WO2008/3637 A2, 2008 ;
Location in patent: Page/Page column 10-11 ;
1: in o-xylene T=120°C; 48 h; 2: With sulfuric acid in o-xylene; water pH=1.8; 3: With sodium hydroxide in o-xylene; water pH=8; Product distribution / selectivity;
1: in o-xylene T=120°C; 48 h; 2: With sulfuric acid in o-xylene; water pH=1.8; 3: With sodium hydroxide in o-xylene; water pH=8; Product distribution / selectivity;
1: in o-xylene T=120°C; 48 h; 2: With sulfuric acid in o-xylene; water pH=1.8; 3: With sodium hydroxide in o-xylene; water pH=8; Product distribution / selectivity;
1: in o-xylene T=120°C; 48 h; 2: With sulfuric acid in o-xylene; water pH=1.8; 3: With sodium hydroxide in o-xylene; water pH=8; Product distribution / selectivity;
