in cyclohexane Irradiation (UV/VIS); photolysis (185 nm); 30percent conversion; 18percent Me3GeH, 5percent Me4Ge, 29percent (Me3Ge)2, 1percent (Me3GeMe2Ge)2, and 1percent Me3GeGeMe2H obtained;

in cyclohexane Irradiation (UV/VIS); photolysis (185 nm); 30percent conversion; 18percent Me3GeH, 5percent Me4Ge, 29percent (Me3Ge)2, 1percent (Me3GeMe2Ge)2, and 1percent Me3GeGeMe2H obtained;

in cyclohexane Irradiation (UV/VIS); photolysis (185 nm); 30percent conversion; 18percent Me3GeH, 5percent Me4Ge, 29percent (Me3Ge)2, 1percent (Me3GeMe2Ge)2, and 1percent Me3GeGeMe2H obtained;

naphthalene in tetrachloromethane; acetonitrile byproducts: (CCl3)2; Irradiation (UV/VIS); in MeCN:CCl4=10:0.43 v/v; high-pressure Hg-lamp (450 W), 1 h, 0°C; product mixt. not sepd., detd. by gas chromy., NMR and mass spectroscopy; product ratio mono:di=4.6:5.7, total conversion 6.0percent;

in cyclohexane Irradiation (UV/VIS); photolysis (185 nm); 30percent conversion; 18percent Me3GeH, 5percent Me4Ge, 29percent (Me3Ge)2, 1percent (Me3GeMe2Ge)2, and 1percent Me3GeGeMe2H obtained;