hydrogenchloride in neat (no solvent) Kinetics; byproducts: H2O; sample fluidization in Pyrex glass in Ar/HCl gas mixt. at const. temp. in range 150-180 (+/-0.2)°C; manometric monotoring;
carbon in gas byproducts: CO; by chlorination-chem. vapor transport react.; mixt. of Er2O3 and Nd2O3 with carbon and KCl (1:1:6:1 at. ratio) placed in alumina reactor and chlorinated with dry Cl2 (20 cm**3/min) at 800 K for 2 h; gas replace by Ar:Cl2 at 800-1300 K; detn. of separation factor;
参考文献
Journal of Alloys and Compounds, , vol. 413, # 1-2 p. 175 - 180
in neat (no solvent) absence of moisture; large excess AlCl3, evacuated quartz tube, 573 K; fractional sublimation over 450 to 650 K gradient, removal of residual AlCl3 on heating in Cl2/N2 stream;
in neat (no solvent) (N2); Nd2O3 powder in quartz boat set in quartz react. tube of horizontal electric furnace; CCl4/N2 mixed gas introduced to react. tube for 6 h at 773 K and then at 973 K and kept for 9 h with N2 flow; detd. by XRD;
参考文献
Journal of Alloys and Compounds, , vol. 393, # 1-2 p. L1-L5
in neat (no solvent) Al2Cl6 prepd. from Al and Cl2; in Duran tube, at 500°C (Cl2); chemical vapour phase transport with Al2Cl6 from 500 to 400°C, 24 h;
参考文献
Gunsilius, H.; Urland, W.; Kremer, R.
Zeitschrift fuer Anorganische und Allgemeine Chemie, 1987 , vol. 550, p. 35 - 40
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反应条件
in neat (no solvent) byproducts: O2; react. of thermal degassed Nd2O3 and Cl2 (prepared by decompn. of cupric chloride) in a quartz reactor with a high-frequency discharge, temp. up to 1320 K), total pressure and partial pressure of Cl2, getting NdOCl by incomplete binding of Cl2;
参考文献
Inorganic Materials (Transl. of Neorg. Mater.), , vol. 21, p. 1085 - 1087
Izvestiya Akademii Nauk SSSR, Neorganicheskie Materialy, , vol. 21, p. 1237 - 1238
